Hole Trapping in Germanium Bombarded by High-Energy Electrons
- 15 June 1956
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 102 (6), 1451-1455
- https://doi.org/10.1103/physrev.102.1451
Abstract
On the basis of an investigation of -type germanium bombarded with high-energy electrons, it is herein concluded that a particular set of temporary hole traps is created by the bombardment. The bombardment centers which remained in the samples at room temperature were measured by resistivity changes and found to agree with the densities of traps. Different samples with trap densities varying from 5×/cc to 5×/cc were studied.
Keywords
This publication has 3 references indexed in Scilit:
- Trapping of Minority Carriers in Silicon. I.-Type SiliconPhysical Review B, 1955
- Effect of Traps on Carrier Injection in SemiconductorsPhysical Review B, 1953
- Temporary Traps in Silicon and GermaniumPhysical Review B, 1953