Microhardness and other properties of hydrogenated amorphous silicon carbide thin films formed by plasma-enhanced chemical vapor deposition
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (2), 201-206
- https://doi.org/10.1016/0040-6090(83)90022-6
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Hydrogen content of a variety of plasma-deposited silicon nitridesJournal of Applied Physics, 1982
- ‘Elastic’ and ‘Plastic’ Hardness of Hard MaterialsNature, 1952