Fabrication of Nb/Al,AlOx/Al/Nb Josephson tunnel junctions using reactive ion etching in SF6
- 1 May 1993
- journal article
- Published by Elsevier in Physica C: Superconductivity and its Applications
- Vol. 209 (4), 477-485
- https://doi.org/10.1016/0921-4534(93)90563-6
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Sub-μm, planarized, Nb-AlOx-Nb Josephson process for 125 mm wafers developed in partnership with Si technologyApplied Physics Letters, 1991
- Nb/AlOx/Nb trilayer process for the fabrication of submicron Josephson junctions and low-noise dc SQUIDsApplied Physics Letters, 1991
- Characterization of different types of Nb-AlO/sub x/ based Josephson tunnel junctionsIEEE Transactions on Magnetics, 1991
- Ultra-high quality Nb/AlO/sub x//Nb tunnel junctions with epitaxial base layersIEEE Transactions on Magnetics, 1991
- Fabrication of micron size Nb/Al-Al/sub 2/O/sub 3//Nb junctions with a trilevel resist liftoff processIEEE Transactions on Magnetics, 1991
- Effects of alternating bias current on the low-frequency noise in dc SQUIDsJournal of Applied Physics, 1988
- Low-frequency excess noise in Nb-Al2O3-Nb Josephson tunnel junctionsApplied Physics Letters, 1987
- A novel modulation technique for 1/f noise reduction in dc SQUIDsIEEE Transactions on Magnetics, 1987
- Composition ofNoise in Metal-Insulator-Metal Tunnel JunctionsPhysical Review Letters, 1984
- High quality refractory Josephson tunnel junctions utilizing thin aluminum layersApplied Physics Letters, 1983