Design and Synthesis of New Alicyclic Acrylate Polymer with Androstane Moiety for 193nm Resist.
- 1 January 1999
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 12 (3), 477-486
- https://doi.org/10.2494/photopolymer.12.477