Surface properties of SiOx monolayer photochemically formed on oxide semiconductors
- 1 August 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 281-282, 404-408
- https://doi.org/10.1016/0040-6090(96)08692-0
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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