N-channel and p-channel amorphous-silicon field-effect transistors have been fabricated on a glassy substrate using undoped and impurity-doped a-Si films as the semiconductor and silicon nitride deposited from an SiH4-N2 mixture as the gate insulator. A change in the source-drain conductance of greater than four orders of magnitude is realised by changing the gate potential from 0 to 5 V.