An investigation of the reactive ion etching of polysilicon in pure Cl2 plasmas by i n s i t u ellipsometry and quadrupole mass spectrometry
- 1 September 1990
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 8 (5), 1044-1051
- https://doi.org/10.1116/1.584958