A sensitive method of surface composition analysis is obtained through monitoring the binary scattering of low energy noble gas ions from surface atoms. Such analyses have been shown to be accomplished with simplified instrumentation and to be primarily sensitive to the first atomic surface layer. The technique has been extended to include the direct examination of electrically insulating surfaces, and examples of surface compositions obtained from ceramic and glass will be presented. With the capability of examining surfaces irrespective of their electrical conductivity, multilayer thin film structures become a prime example of the dual utilization of the probe ion beam to both analyze and simultaneously controllably remove surface atoms. Such a depth composition profile will be shown for a TiO2 thin film sandwich in which interface contamination was found. Quantitative aspects of the technique will be shown in the SiOx system. Diverse applications of surface analyses will also be shown on metal, semiconductor, and some select alloy surfaces.