Electrical characteristics of MOS capacitor using amorphous Gd2O3-doped HfO2 insulator
- 30 June 2010
- journal article
- Published by Elsevier BV in Journal of Rare Earths
- Vol. 28 (3), 396-398
- https://doi.org/10.1016/s1002-0721(09)60119-8
Abstract
No abstract availableKeywords
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