GaInAsP/InP DH laser on semi-insulating InP substrate with terrace structure

Abstract
GaInAsP/InP DH lasers for the 1.3 μm region were fabricated through a single LPE process on semi-insulating InP substrates with a terrace structure. The threshold current of the mounted lasers was typically 65 mA under CW operation at room temperature. Light output of 450 mW per facet was achieved at a pulsed injection current of 4.2 A.