Kondo Effect in Electromigrated Gold Break Junctions
- 29 July 2005
- journal article
- Published by American Chemical Society (ACS) in Nano Letters
- Vol. 5 (9), 1685-1688
- https://doi.org/10.1021/nl050799i
Abstract
We present gate-dependent transport measurements of Kondo impurities in bare gold break junctions, generated with high yield using an electromigration process that is actively controlled. Thirty percent of measured devices show zero-bias conductance peaks. Temperature dependence suggests Kondo temperatures approximately 7 K. The peak splitting in magnetic field is consistent with theoretical predictions for g = 2, though in many devices the splitting is offset from 2g mu(B)B by a fixed energy. The Kondo resonances observed here may be due to atomic-scale metallic grains formed during electromigration.Keywords
This publication has 26 references indexed in Scilit:
- Fabrication of metallic electrodes with nanometer separation by electromigrationApplied Physics Letters, 1999
- A Tunable Kondo Effect in Quantum DotsScience, 1998
- Kondo effect in a single-electron transistorNature, 1998
- Kondo-assisted and resonant tunneling via a single charge trap: A realization of the Anderson model out of equilibriumPhysical Review Letters, 1994
- Experimental observation of scattering of tunneling electrons by a single magnetic momentPhysical Review Letters, 1992
- Electromigration in metalsReports on Progress in Physics, 1989
- Ultra-high magnetic field study of the Kondo-type zero-bias conductance peak in magnetically doped metal-insulator-metal tunnel junctionsPhysical Review B, 1978
- Zero-Bias Tunneling Anomalies—Temperature, Voltage, and Magnetic Field DependencePhysical Review B, 1968
- Exchange Model of Zero-Bias Tunneling AnomaliesPhysical Review B, 1967
- Messungen mit Hilfe von flüssigem Helium XI Widerstand der reinen Metalle in tiefen TemperaturenAnnalen der Physik, 1930