Electrical resistivity of polycrystalline niobium nitride films
- 15 March 1988
- journal article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 37 (8), 3970-3972
- https://doi.org/10.1103/physrevb.37.3970
Abstract
The electrical resistivity of magnetron-sputtered polycrystalline NbN thin films has been measured as a function of the temperature for a variety of samples exhibiting different grain structures. The data are very well described by a model recently proposed by Reiss, Vancea, and Hoffman for granular metallic systems. The model correctly predicts the observed negative temperature coefficient of resistivity and the occurrence of a minimum in the temperature dependence of the resistivity. © 1988 The American Physical SocietyKeywords
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