On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas
- 1 March 1989
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 9 (1), 3-12
- https://doi.org/10.1007/bf01015823
Abstract
No abstract availableKeywords
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