ISICL: In situ coherent lidar for particle detection in semiconductor-processing equipment
- 20 March 1995
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 34 (9), 1579-1590
- https://doi.org/10.1364/ao.34.001579
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.This publication has 6 references indexed in Scilit:
- Electrostatic trapping of contamination particles in a process plasma environmentApplied Physics Letters, 1991
- A model for particulate contaminated glow dischargesJournal of Applied Physics, 1991
- REACHING THE SHOT NOISE LIMIT FOR $10Optics and Photonics News, 1991
- In situ plasma contamination measurements by HeNe laser light scattering: A case studyJournal of Vacuum Science & Technology A, 1990
- Benefits of real-time, in situ particle monitoring in production medium current implantationIEEE Transactions on Semiconductor Manufacturing, 1989
- Spatial dependence of particle light scattering in an rf silane dischargeApplied Physics Letters, 1985