Magnetocrystalline and Uniaxial Anisotropy in Electrodeposited Single Crystal Films of Cobalt and Nickel
- 1 August 1968
- journal article
- research article
- Published by Physical Society of Japan in Journal of the Physics Society Japan
- Vol. 25 (2), 413-418
- https://doi.org/10.1143/jpsj.25.413
Abstract
Torque magnetometry was used to determine the uniaxial anisotropy, K u , observed in addition to the normal magnetocrystalline anisotropy ( K 1 and K 2 ) in single crystal f.c.c. Co and Ni films electrodeposited on to (110) Cu single crystal substrates. The easy direction of K u was found to be the [001] in the film plane and its magnitude at 1000Å was of the order of K 1 for each material with maximum values of -7.7×10 5 erg cm -3 for Co and -3.4×10 5 erg cm -3 for Ni occurring at about 150Å at which thickness K 1 and K 2 also attained maxima. An empirical relation describing the dependence upon thickness t in angströms is given of the form, \begin{aligned} -K_{u}(\text{erg}\ \text{cm}^{-3}){=}K_{0}\exp(-t/n)+K_{\infty}[1-\exp(-t/100)] \end{aligned} The two terms represent the contributions from strain energy originating in the initial layers and in hydrogen included into the deposit respectively. Measurements of K 1 , K 2 and K u are given for composite layer films which yield unexpected results.Keywords
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