Tungsten Oxide Coatings from the Aerosol-Assisted Chemical Vapor Deposition of W(OAr)6 (Ar = C6H5, C6H4F-4, C6H3F2-3,4); Photocatalytically Active γ-WO3 Films
- 17 June 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 15 (14), 2786-2796
- https://doi.org/10.1021/cm020390j
Abstract
No abstract availableKeywords
This publication has 33 references indexed in Scilit:
- Raman spectroscopic studies of gasochromic a-WO3 thin filmsElectrochimica Acta, 2001
- Electrochemical properties of sol-gel deposited vanadium pentoxide filmsThin Solid Films, 1997
- An overview of semiconductor photocatalysisJournal of Photochemistry and Photobiology A: Chemistry, 1997
- Deposition of Electrochromic Tungsten Oxide Thin Films by Plasma‐Enhanced Chemical Vapor DepositionJournal of the Electrochemical Society, 1997
- Chemical vapour deposition of electrochromic tungsten oxide films employing volatile tungsten(VI) oxo alkoxide/β-diketonate complexesChemical Communications, 1996
- Tungsten(6+) Tris(pinacolate): Structure and Comments on the Preference for an Octahedral Geometry Relative to Trigonal Prismatic (D3h) for a d0 Complex in the Presence of Strong .pi.-Donor LigandsInorganic Chemistry, 1994
- Low-temperature atmospheric-pressure chemical vapor deposition of tungsten oxide thin filmsThin Solid Films, 1993
- Solid state and solution studies of tungsten(VI) oxotetraalkoxidesJ. Chem. Soc., Dalton Trans., 1992
- Electrochemical behavior of tungsten(VI) aryloxides and catecholatesInorganic Chemistry, 1986
- Dialkylhydroxylamido(1—)-O,N Complexes of Tungsten(VI) with Terminal Oxo and Thio LigandsAustralian Journal of Chemistry, 1985