Internal Stress and Cracking in Electrodeposited Chromium
- 1 January 1963
- journal article
- research article
- Published by Taylor & Francis in Transactions of the IMF
- Vol. 40 (1), 197-204
- https://doi.org/10.1080/00202967.1963.11869868
Abstract
The time variation of the mean stress level in chromium electrodeposited from a number of different plating solutions has been examined continuously as function of current density and temperature. An attempt imade to relate these stresses to the assumed deposition mechanism. Evidence is presented which suggests that cracks form along films of oxide resulting from incorporation cf the cathode layer.Keywords
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