Characterization of RF Sputter‐Deposited Ti‐W Schottky Barrier Diodes in Boron‐Doped Silicon
- 1 July 1984
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 131 (7), 1712-1715
- https://doi.org/10.1149/1.2115944