Effect of partial pressure of the reactant gas on the chemical vapour deposition of Al2O3
- 1 November 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 97 (1), 97-106
- https://doi.org/10.1016/0040-6090(82)90421-7
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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