Activation energies associated with current noise of thin metal films
- 1 September 1988
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 17 (5), 467-471
- https://doi.org/10.1007/bf02652134
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Electromigration mechanisms in aluminum linesSolid-State Electronics, 1985
- Noise and Grain-Boundary Diffusion in Aluminum and Aluminum AlloysPhysical Review Letters, 1985
- Temperature-ramp resistance analysis to characterize electromigrationSolid-State Electronics, 1983
- Low-frequency fluctuations in solids:noiseReviews of Modern Physics, 1981
- Activation energies for the different electromigration mechanisms in aluminumSolid-State Electronics, 1981
- Electromigration in thin gold films on molybdenum surfacesThin Solid Films, 1975
- Screening of metal film defects by current noise measurementsApplied Physics Letters, 1973
- Electromigration failure modes in aluminum metallization for semiconductor devicesProceedings of the IEEE, 1969
- Nuclear Relaxation in AluminumPhysical Review B, 1959