The influence of residual gas pressure on the stress in aluminium films
- 1 April 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 42 (2), 169-173
- https://doi.org/10.1016/0040-6090(77)90414-x
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- The initial oxidation of aluminum thin films at room temperatureSurface Science, 1972
- Grain Growth and Stress Relief in Thin FilmsJournal of Vacuum Science and Technology, 1972
- The use of a quartz crystal microbalance to study the oxidation of aluminum during vacuum depositionThin Solid Films, 1971
- Density of Thin Evaporated Aluminum FilmsJournal of Vacuum Science and Technology, 1965
- Electrical Properties of Evaporated Aluminum Oxide FilmsJournal of the Electrochemical Society, 1962