Extrapolation of high-voltage stress measurements to low-voltage operation for thin silicon-oxide films
- 1 April 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Reliability
- Vol. 40 (1), 102-109
- https://doi.org/10.1109/24.75344
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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