Silane plasma and surface processes in amorphous silicon deposition
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 777-780
- https://doi.org/10.1016/0022-3093(85)90775-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Spatial concentrations of silicon atoms by laser-induced fluorescence in a silane glow dischargeApplied Physics Letters, 1984
- Fundamental mechanisms in silane plasma decompositions and amorphous silicon depositionJournal of Non-Crystalline Solids, 1983
- Dissociative excitation of SiH4, SiD4, Si2H6 and GeH4 by 0–100 eV electron impactChemical Physics, 1983
- Monte-Carlo simulation of electron properties in rf parallel plate capacitively coupled dischargesJournal of Applied Physics, 1983
- Detection of Neutral Species in Silane Plasma Using Coherent Anti-Stokes Raman SpectroscopyJapanese Journal of Applied Physics, 1983