Formation and characterization of carbon layers deposited during ion bombardment of silicon
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 434-437
- https://doi.org/10.1016/0168-583x(89)90219-x
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Ion-beam-induced crystallization and amorphization of siliconNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Erosion of polymer thin films during ion bombardmentJournal of Vacuum Science & Technology A, 1983