Simulation of structural anisotropy and void formation in amorphous thin films
- 1 December 1974
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 25 (11), 641-643
- https://doi.org/10.1063/1.1655341
Abstract
We have computer simulated the structure of thin amorphous films grown from a vapor. Our hard‐sphere model shows that structural anisotropy and voids are a natural occurrence of the deposition process. The amount of unfilled space (voids) and the anisotropy have been studied as a function of the angle of incidence of the vapor stream upon the substrate.Keywords
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