Laser-induced photochemical etching of InP by HBr and HCl
- 1 December 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 43 (1-4), 416-423
- https://doi.org/10.1016/0169-4332(89)90249-3
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Properties of laser-induced thermochemical etching of InPJournal of Electronic Materials, 1988
- Dry, laser-assisted rapid HBr etching of GaAsApplied Physics Letters, 1985
- Photochemical dry etching of GaAsApplied Physics Letters, 1984
- Laser-enhanced gas–surface chemistry: Basic processes and applicationsJournal of Vacuum Science and Technology, 1982
- Vacuum ultraviolet absorption cross sections for halogen containing moleculesJournal of Applied Physics, 1980