Application of electrical effective channel length and external resistance measurement techniques to a submicrometer CMOS process
Open Access
- 1 November 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 36 (11), 2499-2505
- https://doi.org/10.1109/16.43673
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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