Electronic Properties and Device Applications of Hot-Wire CVD Polycrystalline Silicon Films
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Polycrystalline silicon films obtained by hot-wire chemical vapour depositionApplied Physics A, 1994
- Improvement of grain size and deposition rate of microcrystalline silicon by use of very high frequency glow dischargeApplied Physics Letters, 1994
- Investigation of polycrystalline silicon deposition on glass substratesSolar Energy Materials and Solar Cells, 1993
- Effect of grain boundaries on the Raman spectra, optical absorption, and elastic light scattering in nanometer-sized crystalline siliconPhysical Review B, 1987