Differential sputtering of MgO/Au cermet films and its application to high-yield secondary-electron emitters
- 31 March 1974
- journal article
- Published by Elsevier in Surface Science
- Vol. 42 (1), 139-156
- https://doi.org/10.1016/0039-6028(74)90009-0
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- High-efficiency secondary-electron emission from sputtered MgO–Au cermetsApplied Physics Letters, 1973
- Fast, Accurate Secondary-Electron Yield Measurements at Low Primary EnergiesReview of Scientific Instruments, 1973
- Review: Sputtering mechanisms for amorphous and polycrystalline solidsJournal of Materials Science, 1973
- The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processesVacuum, 1972
- Escape Depths of X-ray Excited ElectronsPhysica Scripta, 1972
- Alloy Sputtering Studies with in situ Auger Electron SpectroscopyJournal of Applied Physics, 1971
- Sputtering Yields for Low Energy He+-, Kr+-, and Xe+-Ion BombardmentJournal of Applied Physics, 1962
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961
- Low-Energy Sputtering Yields in HgPhysical Review B, 1958
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957