Field-induced resistive switching in metal-oxide interfaces

Abstract

We investigate the polarity-dependent field-induced resistive switching phenomenon driven by electric pulses in perovskite oxides. Our data show that the switching is a common occurrence restricted to an interfacial layer between a deposited metal electrode and the oxide. We determine through impedance spectroscopy that the interfacial layer is no thicker than $10\mathrm{nm}$ and that the switch is accompanied by a small capacitance increase associated with charge accumulation. Based on interfacial $I–V$ characterization and measurement of the temperature dependence of the resistance, we propose that a field-created crystalline defect mechanism, which is controllable for devices, drives the switch.