Effects of silylation parameters on the lithographic performance of the desire system
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4), 291-297
- https://doi.org/10.1016/0167-9317(86)90057-2
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Silicon-Containing Resists For Bi-Layer Resist SystemsPublished by SPIE-Intl Soc Optical Eng ,1985