Scaling of the Droplet-Size Distribution in Vapor-Deposited Thin Films

Abstract

A dynamic-scaling approach is developed for the description of the droplet-size distribution in vapor-deposited thin films and processes where droplets are formed by nucleation, growth, and coalescence of the droplets. The exponent describing the scaling of the droplet-size distribution and the growth law for the mean droplet size are calculated exactly. A realistic, yet simple, droplet-growth model is developed. The simulation data are found to be consistent with the experiments on vapor-deposited tin and with the theoretical predictions in $d=1, 2, \mathrm{and} 3$.