Capacity of electron beam reducing image projection systems with dynamically compensated field aberrations
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4), 217-220
- https://doi.org/10.1016/0167-9317(89)90051-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Electron-Beam Proximity Printing—A New High-Speed Lithography Method for Submicron StructuresIBM Journal of Research and Development, 1982
- Accuracy of image positioning in an electron beam proximity printerJournal of Vacuum Science and Technology, 1981
- Electron Beam Projection TechniquesPublished by Elsevier ,1980
- Electron-projection microfabrication systemJournal of Vacuum Science and Technology, 1975