Versatile double AC Hall effect system for profiling impurities in semiconductors
- 1 April 1977
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 10 (4), 335-337
- https://doi.org/10.1088/0022-3735/10/4/006
Abstract
A versatile system is described for measuring electrically active impurity distributions in semiconductors. The system uses an improved double AC Hall system for sensitive measurement of the Hall effect in conjunction with chemical etching for removal of successive layers. All processing is done with samples mounted on standardized discs, increasing the convenience and speed of the technique for repetitive measurements. A measured profile of Be-implanted GaAs obtained with this system is presented as an example.Keywords
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