Low energy lithography; energy control and variable energy exposure
- 28 February 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 27 (1-4), 135-138
- https://doi.org/10.1016/0167-9317(94)00073-4
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Evaluation of Moiré patterns obtained by the “self-comparison-method” to characterize particle beam lithography systemsMicroelectronic Engineering, 1990
- Compound magnetic and electrostatic lenses for low-voltage applicationsJournal of Vacuum Science & Technology B, 1989
- Verification of a proximity effect correction program in electron-beam lithographyJournal of Vacuum Science and Technology, 1981