Critical fields of Nb-Ta multilayers
- 1 February 1987
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 35 (4), 1664-1668
- https://doi.org/10.1103/physrevb.35.1664
Abstract
Nb-Ta multilayered films prepared by magnetron sputtering have been studied by critical-field measurements. We have examined the effects of substrate orientation and deposition temperature on the properties of the films. Three-dimensional to two-dimensional crossover is observed. For films with larger Nb layer thicknesses an additional transition in at lower temperatures is observed which cannot be accounted for by the interfacial regions.
Keywords
This publication has 16 references indexed in Scilit:
- Perpendicular upper critical field of superconducting–normal-metal multilayersPhysical Review B, 1985
- Magnetic and Structural Properties of Single-Crystal Rare-Earth Gd-Y SuperlatticesPhysical Review Letters, 1985
- Dimensional crossover in superlattice superconductorsPhysical Review B, 1984
- Critical-field measurements in Nb-Ti composition-modulated alloysJournal of Low Temperature Physics, 1982
- Growth of single-crystal metal superlattices in chosen orientationsJournal of Physics F: Metal Physics, 1982
- Thermalization of sputtered atomsJournal of Applied Physics, 1981
- Nb-Ta metal superlatticesJournal of Physics F: Metal Physics, 1981
- Critical fieldsandof superconducting niobiumPhysical Review B, 1981
- X-ray analysis of sputtered films of beta-tantalum and body-centered cubic tantalumThin Solid Films, 1972
- Electrical Characteristics of rf-Sputtered Single-Crystal Niobium FilmsJournal of Applied Physics, 1972