Reflection High-Energy Electron Diffraction (RHEED) Oscillations at 77 K
- 20 February 1989
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 62 (8), 921-924
- https://doi.org/10.1103/physrevlett.62.921
Abstract
Strong intensity oscillations have been found in RHEED during epitaxial growth at 77 K. This temperature is too low for thermally activated diffusion and establishes that the deposited atom uses its latent heat of condensation to skip across the surface, preferentially coming to rest at growing island edges, to achieve quasi—layer-by-layer growth. This growth mechanism implies that RHEED oscillations should be observable at 0 K. The data also provide insight into the basic principles governing RHEED oscillations.Keywords
This publication has 72 references indexed in Scilit:
- Use of LEED intensity oscillations in monitoring thin film growthLangmuir, 1988
- Growth mechanism for molecular-beam epitaxy of group-IV semiconductorsPhysical Review B, 1988
- Monte Carlo simulations of the growth of diamond-structure semiconductors and surface-reflected electron-beam intensities during molecular-beam epitaxyJournal of Vacuum Science & Technology B, 1988
- Influence of surface step density on reflection high-energy-electron diffraction specular intensity during epitaxial growthPhysical Review B, 1987
- A study of strain-related effects in the molecular-beam epitaxy growth of InxGa1−xAs on GaAs using reflection high-energy electron diffractionJournal of Vacuum Science & Technology B, 1987
- Comparative study of the growth processes of GaAs, AlGaAs, InGaAs, and InAlAs lattice matched and nonlattice matched semiconductors using high-energy electron diffractionJournal of Applied Physics, 1987
- Observations on intensity oscillations in reflection high-energy electron diffraction during epitaxial growth of Si(001) and Ge(001)Applied Physics Letters, 1986
- Implications of the configuration-dependent reactive incorporation growth process for the group V pressure and substrate temperature dependence of III-V molecular beam epitaxial growth and the dynamics of the reflection high-energy electron diffraction intensityApplied Physics Letters, 1985
- X-ray photoelectron and Auger-electron forward scattering: A new tool for studying epitaxial growth and core-level binding-energy shiftsPhysical Review B, 1984
- RHEED oscillation studies of MBE growth kinetics and lattice mismatch strain-induced effects during InGaAs growth on GaAs(100)Journal of Vacuum Science & Technology B, 1984