Influence of layer thickness on nucleation in amorphous silicon thin films
- 30 April 1990
- journal article
- Published by Elsevier in Materials Letters
- Vol. 9 (7-8), 259-262
- https://doi.org/10.1016/0167-577x(90)90056-r
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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