Kinetics of Oxidation of Hot‐Pressed Silicon Nitride Containing Magnesia
- 1 November 1978
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 61 (11-12), 512-517
- https://doi.org/10.1111/j.1151-2916.1978.tb16130.x
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- Oxidation of Si3N4 in the Range 1300° to 1500°CJournal of the American Ceramic Society, 1976
- The dissolution of nitrogen in metallurgical slagsCanadian Metallurgical Quarterly, 1976
- The dissolution of nitrogen in metallurgical slagsCanadian Metallurgical Quarterly, 1976
- Thermodynamics and kinetics of oxidation of hot-pressed silicon nitrideJournal of Materials Science, 1976
- Effect of Water Vapor on the Oxidation of Hot‐Pressed Silicon Nitride and Silicon CarbideJournal of the American Ceramic Society, 1976
- ChemInform Abstract: OXIDATION BEHAVIOR OF HOT-PRESSED SI3N4Chemischer Informationsdienst, 1975
- Mass Spectrometric Analysis of Vapors in Oxidation of Si3N4 CompactsJournal of the American Ceramic Society, 1975
- Oxidation Behavior of Hot‐Pressed Si3N4Journal of the American Ceramic Society, 1975