Lithographic Properties of Poly(tert-butyl methacrylate)-Based Block and Random Copolymer Resists Designed for 193 nm Wavelength Exposure Tools
- 1 January 1996
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 8 (9), 2282-2290
- https://doi.org/10.1021/cm9600135
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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