Atomic oxygen detection by a silver-coated quartz deposition monitor
- 1 June 1990
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 61 (6), 1747-1749
- https://doi.org/10.1063/1.1141145
Abstract
A method for measuring the flux of atomic oxygen utilizing a silverfilm on a quartz‐crystal deposition rate monitor is described. Measuring the initial oxidation rate of the silver, which is proportional to the atomic oxygen flux, determines a lower limit on the atomic oxygen flux. This method is more direct than measuring the conductance of the silverfilm, has an intrinsic flux detection range of 101 3–101 7 atoms/cm2 s, and is reversible by exposing the sensor to an atomic hydrogen flux.Keywords
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