Strongly anisotropic field ionization of a common deep level in GaAs
- 1 January 1979
- journal article
- Published by EDP Sciences in Journal de Physique Lettres
- Vol. 40 (2), 31-33
- https://doi.org/10.1051/jphyslet:0197900400203100
Abstract
We observe a very strong anisotropy of the internal field effect for defect « EL2 » (a well-known deep level, assigned in the past to oxygen) in GaAs. The ionization rate is maximum when the electric field is 111 oriented, pointing from As, to Ga and is minimum for the opposite 111 field orientation. Conclusions concerning the microscopic defect structure can be deduced from this behaviour. This new method of investigation of the symmetry properties of deep level defects can be more generally applied to all the levels emitting into the conduction band of GaAs, its related compounds and any other high-mobility semiconductorKeywords
This publication has 8 references indexed in Scilit:
- Self-Consistent Green's-Function Calculation of the Ideal Si VacancyPhysical Review Letters, 1978
- Photocapacitance quenching effect for “oxygen” in GaAsSolid State Communications, 1978
- Trap depth and electron capture cross section determination by trap refilling experiments in Schottky diodesApplied Physics Letters, 1978
- Net Optical Quenching Spectrum and Disappearance of Stationary High-Field Domain in GaAs: Cr single CrystalJapanese Journal of Applied Physics, 1978
- The band structure dependence of impact ionization by hot carriers in semiconductors: GaAsSolid-State Electronics, 1978
- Electron traps in bulk and epitaxial GaAs crystalsElectronics Letters, 1977
- Deep-level transient spectroscopy: A new method to characterize traps in semiconductorsJournal of Applied Physics, 1974
- Field and thermionic-field emission in Schottky barriersSolid-State Electronics, 1966