Preparation and properties of reactively sputtered tungsten oxide films
- 1 April 1982
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (4), 3070-3075
- https://doi.org/10.1063/1.331053
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- A Model for Electrochromic Tungstic Oxide Microstructure and DegradationJournal of the Electrochemical Society, 1981
- Cadmium–tin-oxide films deposited by dc reactive sputtering from a Cd-Sn alloy targetApplied Physics Letters, 1980
- Semiconductor Electrodes: XXII . Electrochromism and Photoelectrochemistry at Layers Prepared by Thermal and Anodic Oxidation of WJournal of the Electrochemical Society, 1979
- Electrochromic iridium oxide films prepared by reactive sputteringApplied Physics Letters, 1979
- Cadmium-tin oxide films deposited by rf sputtering from a CdO-SnO2 targetApplied Physics Letters, 1979
- Electrochromism of heat-treated anodic iridium oxide films in acidic, neutral, and alkaline solutionsApplied Physics Letters, 1978
- Electrochromism in Li x WO 3Journal of the Electrochemical Society, 1978
- Dynamics of coloration of amorphous electrochromic films of WO3 at low voltagesApplied Physics Letters, 1976
- Performance characteristics of electrochromic displaysIEEE Transactions on Electron Devices, 1975
- Optical and photoelectric properties and colour centres in thin films of tungsten oxidePhilosophical Magazine, 1973