Room-Temperature Mobility of Two-Dimensional Electron Gas in Selectively Doped GaAs/N-AlGaAs Heterojunction Structures

Abstract
Room-temperature mobility of two-dimensional electron gas accumulating at a heterojunction interface in selectively doped GaAs/N-AlGaAs grown by MBE was shown to be potentially as high as 8,600 cm2/Vs with a sheet electron concentration of 5.5×1011 cm-2. This is almost twice as high as the mobility in conventional GaAs FETs with typical carrier concentrations.