Abstract
A new mechanism of absorption of electromagnetic radiation at low temperatures in n-type silicon and germanium has been investigated. The wavelength region is from 0.01 to 0.1 cm for Si and from 0.035 to 0.5 cm for Ge. Donor concentrations up to 2 × 1017 cm3 in Si and 6 × 1015 cm3 in Ge and compensations up to 0.1 were considered. The model used was that of the photon-induced transitions of electrons between the 1s σg- and 2p σu-like states of ionized donor pairs. The formula for the absorption coefficient is derived and numerical results are presented. The role of the ionized-donor-pair molecule-ion traps in hopping processes is also discussed.