Ion response to plasma excitation frequency
- 1 December 1981
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 52 (12), 7064-7066
- https://doi.org/10.1063/1.328703
Abstract
The time dependence of the potential distribution in a parallel plate discharge is discussed in terms of a model which indicates the plasma potential oscillates with the applied voltage only over the positive part of the cycle. Measurements of this oscillation have been made, and the response of the ions to the oscillating field has been studied as a function of excitation frequency.Keywords
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