The role of implantation temperature and dose in the control of the microstructure of SIMOX structures
- 31 December 1988
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 8 (3-4), 163-186
- https://doi.org/10.1016/0167-9317(88)90015-9
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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