Non-stoichiometry of MoS2 phase prepared by sputtering

Abstract

The lattice parameters and S/Mo atomic ratio in sputtered MoS₂ films have been examined as a function of sputtering conditions, especially the vacuum pressure in the chamber. It was found that the deposited films had a defect MoS₂ structure ranging from 1^.6 to 2 in S/Mo ratio, depending on the pressure.