Mechanical characterization of ultra-thin fluorocarbon films deposited by R.F. magnetron sputtering
- 11 November 2004
- Vol. 43 (2), 345-350
- https://doi.org/10.1016/j.carbon.2004.09.022
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Co-deposition of titanium/polytetrafluoroethylene films by unbalanced magnetron sputteringSurface and Coatings Technology, 2001
- Rf magnetron sputtering of polytetrafluoroethylene under various conditionsThin Solid Films, 2001
- Low dielectric fluorinated amorphous carbon thin films grown from C6F6 and Ar plasmaThin Solid Films, 2000
- Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmasThin Solid Films, 2000
- The property of plasma-polymerized fluorocarbon film in relation to CH4/C4F8 ratio and substrate temperatureSensors and Actuators A: Physical, 2000
- The deposition of anti-adhesive ultra-thin teflon-like films and their interaction with polymers during hot embossingApplied Surface Science, 1999
- Molecular Design of Fluorocarbon Film Architecture by Pulsed Plasma Enhanced and Pyrolytic Chemical Vapor DepositionPlasmas and Polymers, 1999
- Thin Teflon-like films for eliminating adhesion in released polysilicon microstructuresSensors and Actuators A: Physical, 1998
- A novel deposition technique for fluorocarbon films and its applications for bulk- and surface-micromachined devicesSensors and Actuators A: Physical, 1998
- Low dielectric constant materials for interlayer dielectricMicroelectronic Engineering, 1998