Multilayer resists with variable layer parameters for submicron lithography
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4), 553-556
- https://doi.org/10.1016/0167-9317(90)90169-t
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Electron beam lithography resolution upon exposure of superthick resist layersMicroelectronic Engineering, 1989
- Investigation of structure profiles in negative resistsMicroelectronic Engineering, 1986
- Photoelectron exposure of x-ray resistsMicroelectronic Engineering, 1985
- Submicrometre lift-off line with T-shaped cross-sectional formElectronics Letters, 1981
- Speed enhancement of PMMA resistJournal of Vacuum Science and Technology, 1979